JPH0211489B2 - - Google Patents
Info
- Publication number
- JPH0211489B2 JPH0211489B2 JP14015885A JP14015885A JPH0211489B2 JP H0211489 B2 JPH0211489 B2 JP H0211489B2 JP 14015885 A JP14015885 A JP 14015885A JP 14015885 A JP14015885 A JP 14015885A JP H0211489 B2 JPH0211489 B2 JP H0211489B2
- Authority
- JP
- Japan
- Prior art keywords
- cassette
- base plate
- wafer
- wafers
- support
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 238000012546 transfer Methods 0.000 claims description 14
- 239000000463 material Substances 0.000 claims description 6
- 235000012431 wafers Nutrition 0.000 description 57
- 230000003028 elevating effect Effects 0.000 description 9
- 238000003825 pressing Methods 0.000 description 7
- 238000000034 method Methods 0.000 description 4
- 239000004065 semiconductor Substances 0.000 description 4
- 238000012545 processing Methods 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 2
- 230000000630 rising effect Effects 0.000 description 2
- 230000004308 accommodation Effects 0.000 description 1
- 238000013459 approach Methods 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 238000009792 diffusion process Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 229920002120 photoresistant polymer Polymers 0.000 description 1
- 239000010453 quartz Substances 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
Landscapes
- Warehouses Or Storage Devices (AREA)
- Sheets, Magazines, And Separation Thereof (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP14015885A JPS624142A (ja) | 1985-06-28 | 1985-06-28 | 薄板材の移し替え装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP14015885A JPS624142A (ja) | 1985-06-28 | 1985-06-28 | 薄板材の移し替え装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS624142A JPS624142A (ja) | 1987-01-10 |
| JPH0211489B2 true JPH0211489B2 (en]) | 1990-03-14 |
Family
ID=15262215
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP14015885A Granted JPS624142A (ja) | 1985-06-28 | 1985-06-28 | 薄板材の移し替え装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS624142A (en]) |
Families Citing this family (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH068100Y2 (ja) * | 1986-07-01 | 1994-03-02 | 東京エレクトロン相模株式会社 | ウエハ移し替え突き上げ装置 |
| JP2617721B2 (ja) * | 1987-07-20 | 1997-06-04 | 東京エレクトロン株式会社 | ウエハ押し上げ具及びウエハ移し替え装置 |
| US5054988A (en) * | 1988-07-13 | 1991-10-08 | Tel Sagami Limited | Apparatus for transferring semiconductor wafers |
| JPH03125453A (ja) * | 1989-10-09 | 1991-05-28 | Toshiba Corp | 半導体ウエハ移送装置 |
| FR2778496B1 (fr) | 1998-05-05 | 2002-04-19 | Recif Sa | Procede et dispositif de changement de position d'une plaque de semi-conducteur |
| JP2009073544A (ja) * | 2007-09-22 | 2009-04-09 | Konica Minolta Opto Inc | 基板取り出し治具及び記録媒体用ガラス基板の製造方法 |
-
1985
- 1985-06-28 JP JP14015885A patent/JPS624142A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS624142A (ja) | 1987-01-10 |
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